Volume 9, Number 1, March 2009 (ISSN 1598-1657)
     
     
       
      SPECIAL ISSUE ON THE 2008 INTERNATIONAL SOC DESIGN CONFERENCE        
 
 
      Foreword                                                                                                                                      Hong June Park   i    
      Editorial                                                                                                         Jinyong Chung and Sungjoo Yoo   ii    
 
 
     
      Design of 32 bit Parallel Processor Core for High Energy Efficiency using Instruction-Levels Dynamic Voltage Scaling Technique
Yil Suk Yang, Tae Moon Roh, Soon il Yeo, Woo H. Kwon, and Jongdae Kim
  1    
               
      Timing Analysis of Discontinuous RC Interconnect Lines
Taehoon Kim, Youngdoo Song, and Yungseon Eo
  8    
               
      A Low-Voltage High-Speed CMOS Inverter-Based Digital Differential Transmitter with Impedance Matching Control and Mismatch Calibration
Jun-Hyun Bae, Sang-Hune Park, Jae-Yoon Sim, and Hong-June Park
  14    
               
      A Fast RSSI using Novel Logarithmic Gain Amplifiers for Wireless Communication
Sungho Lee, Yonghoon Song, and Sangwook Nam
  22    
               
      Clock Scheduling and Cell Library Information Utilization for Power Supply Noise Reduction
Yooseong Kim, Sangwoo Han, and Juho Kim
  29    
               
      A Scaling Trend of Variation-Tolerant SRAM Circuit Design in Deeper Nanometer Era
Hiroyuki Yamauchi
  37    
               
 
 
    Characteristics of p-Cu2O/n-Si Heterojunction Photodiode made by Rapid Thermal Oxidation
Raid A. Ismail
  51    
             
    Extraction of Ballistic Parameters in 65 nm MOSFETs
Junsoo Kim, Jaehong Lee, Yongmin Kwon, Byung-Gook Park, Jong Duk Lee, and Hyungcheol Shin
  55    
             
    Investigation of Frequency Dependent Sensitivity of Noise Figure on Device Parameters in 65 nm CMOS
MinSuk Koo, Hakchul Jung, HeeSauk Jhon, Byung-Gook Park, Jong Duk Lee, and Hyungcheol Shin
  61    
             
    Monte Carlo Simulation of Ion Implantation Profiles Calibrated for Various Ions over Wide Energy Range
Kunihiro SUZUKI, Yoko TADA, Yuji KATAOKA, and Tsutomu NAGAYAMA
  67    
 
 
               
     
A Publication of the Institute of Electronics Engineers of Korea
       
     
http://www.jsts.org