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	Volume 1, Number 2, June 2001(ISSN 1598-1657)

	JOURNAL OF SEMICONDUCTOR TECHNOLOGY AND SCIENCE

	SPECIAL ISSUE ON THE 2001 KOERAN CONFERENCE ON SEMICONDUCTORS


	Fabrication Process
	Effect of Hydrogen Treatment on Electrical Properties of Hafnium Oxide for Gate Dielectric Application ...........................Kyu-Jeong Choi, Woong-Chul Shin, and Soon-Gil Yoon	95

	Devices
	On the Gate Oxide Scaling of Sub-100nm CMOS Transistors ............................................. .................................................Seungheon Song, Jihye Yi, Woosik Kim, Kazuyuki Fujihara, Ho-Kyu Kang, Joo-Tae Moon, and Moon-Yong Lee	103
	Fabrication and Characterization of 0.2μm InAlAs/InGaAs Metamorphic HEMT's with Inverse Step-Graded InAlAs Buffer on GaAs Substrate..................Dae-Hyum Kim, Sung-Won Kim,, Seong-Chul Hong, Seung-Won Paek, Jae-Hak Lee, Ki-Wong, and Kwang-Weok Seo	111

	Circuits
	POPeye : A System Analysis Simulator for DRAM Performance Evaluation............................. ...................Kangmin Lee, Chi-Weon Yoon, Ramchan Woo, Jeong-Hun Kook, Yon-Kyun Im, and Hoi-Jun Yoo	116
	A Word Line Ramping Technique to Suppress the Program Disturbance of NAND Flash Memory ..............................Jin-Wook Lee, Yeong-Taek Lee, Taehee Cho, Seungjae Lee, Dong-Hwan Kim, Wook-ghee, Hahn, and Kang-Deog Suh	125

	MEMS
	Uniformity Improvement of Micromirror Array for Reliable Working Performance as an Optical Modulator in the Maskless Photolithography System ....................................................... ........................................................................Kook-Nyung Lee and Yong-Kweon Kim	132




	Copyright ⓒ 2001 Institute of Electronics Engineers of Korea All rights reserved.